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本書總結了納米薄膜材料的國內外研究新進展，既詳細地介紹了納米薄膜材料的製備方法，又介紹了它們在電子器件領域的應用。系統闡述了薄膜及納米結構的一系列製備技術，不僅包括溶膠凝膠法、MOCVD、電子束沉積、磁控濺射等傳統技術，還包括近年來新發展起來的高分子輔助沉積法、3D列印、液相-電子束誘導沉積等技術。此外，本書還對納米薄膜及其它納米結構的一些典型應用做了介紹，並給出實例，包括磁性薄膜的應用、氧化物薄膜在燃料電池領域的應用、相變材料在記憶體領域的應用和柔性薄膜器件等。
本書適合材料、微電子等相關專業的研究生、科技人員和教學人員使用。
ListofContributorsXIII
1PulsedLaserDepositionforComplexOxideThinFilmandNanostructure1
ChunruiMaandChonglinChen
1.1Introduction1
1.2PulsedLaserDepositionSystemSetup2
1.3AdvantagesandDisadvantagesofPulsedLaserDeposition3
1.4TheThermodynamicsandKineticsofPulsedLaserDeposition3
1.4.1Laser–MaterialInteractions4
1.4.2DynamicsofthePlasma5
1.4.3NucleationandGrowthoftheFilmontheSubstrateSurface5
1.5MonitoringofGrowthKinetics8
1.5.1IntroductionandRHEEDStudies8
1.5.2GrowthKineticsStudiesbySurfaceX-rayDiffraction9
1.6FundamentalParametersinThinFilmGrowth10
1.6.1SubstrateTemperature10
1.6.2BackgroundGasPressure10
1.6.3LaserFluenceandAblationArea11
1.6.4Target–SubstrateDistance11
1.6.5Post-Annealing12
1.6.6LatticeMisfit12
1.7PulsedLaserDepositionforComplexOxideThinFilmGrowth13
1.7.1PulsedLaserDepositionforSuperconductorThinFilm14
1.7.2PulsedLaserDepositionforFerroelectricThinFilms14
1.7.3PulsedLaserDepositionforFerromagneticThinFilm15
1.7.4PulsedLaserDepositionforMultiferroicsThinFilm15
1.7.5InterfaceStrainEngineeringtheComplexOxideThinFilm16
1.7.5.1ThicknessEffect16
1.7.5.2SubstrateEffect17
1.7.5.3Post-Annealing21
1.8PulsedLaserDepositionforNanostructureGrowth23
1.8.1Self-AssembledNanoscaleStructures23
1.8.2GeometricallyOrderedArrays23
1.9VariationofPulsedLaserDeposition24
1.10Conclusion24
References25
2ElectronBeamEvaporationDeposition33
ZhongpingWangandZengmingZhang
2.1Introduction33
2.2ElectronBeamEvaporationSystem35
2.2.1HeatingPrincipleandCharactersofElectronBeams35
2.2.1.1HeatingPrincipleofElectronBeams35
2.2.1.2CharactersofElectronBeams36
2.2.2EquipmentsofElectronBeamSource37
2.2.2.1FilamentandElectronEmission37
2.2.2.2ElectronBeamControl38
2.2.2.3PowerSupply,Crucibles,andFeedSystems39
2.2.2.4SourceMaterials40
2.2.3ApplicationofElectronBeamEvaporation43
2.2.3.1CoolingofElectronBeamGun43
2.2.3.2EvaporationofSourceMaterialsbyElectronBeam43
2.2.3.3VacuumDepositionProcessofElectronBeamEvaporation44
2.2.3.4AttentionandWarningforElectronBeamEvaporation45
2.3CharacterizationofThinFilm45
2.3.1SurfaceMorphologybyAFM46
2.3.2ThicknessMeasurementbySpectroscopicEllipsometry47
2.4Summary53
Acknowledgments53
References53
3NanostructuresandThinFilmsDepositedwithSputtering59
WeiqingYang
3.1Introduction59
3.2NanostructureswithSputtering60
3.2.1OxideNanostructures61
3.2.1.1Needle-ShapedMoO3Nanowires61
3.2.1.2Bi2O3Nanowires64
3.2.2NitrideNanostructures65
3.2.2.1Graphitic-C3N4NanoconeArray65
3.2.2.2InAlNNanorods68
3.3ThinFilmsDepositedwithSputtering71
3.3.1MetalAlloyThinFilms73
3.3.1.1LaNi5AlloyThinFilms73
3.3.1.2Ni–Mn–InAlloyThinFilms74
3.3.2CompositeMetalOxideThinFilms75
3.3.2.1BiFeO3/BaTiO3BilayerThinFilms75
3.4Summary76
Acknowledgments77
References77
4NanostructuresandQuantumDotsDevelopmentwithMolecularBeamEpitaxy81
WenHuang
4.1Introduction81
4.2TechnologyofMBE82
4.2.1ThePhysicsofMBE83
4.2.2MBEGrowthMechanisms86
4.2.2.1Two-Dimensional(2D)MBEGrowthMechanism87
4.2.2.2Three-Dimensional(3D)MBEGrowthMechanism88
4.2.2.3Stranskie–Krastanow3DGrowthMechanism90
4.3NanoheterostructuresFabricatedbyMolecularBeamEpitaxy91
4.3.1SemiconductingOxideHeterostructuresGrownbyLaserMolecularBeamEpitaxy91
4.3.2Strain-InducedMagneticAnisotropyinHighlyEpitaxialHeterostructurebyLMBE96
4.4QuantumDotsDevelopmentwithMolecularBeamEpitaxy101
4.5Summary103
Acknowledgments104
References104
5CarbonNanomaterialsand2DLayeredMaterialsDevelopmentwithChemicalVaporDeposition105
TaisongPan
5.1Introduction105
5.2CarbonNanotubeSynthesisbyChemicalVaporDeposition106
5.2.1OverviewofCVDProcessofCarbonNanotubeGrowth106
5.2.2ControlofCarbonNanotubeStructure108
5.2.3TheAlignmentofCarbonNanotubeArray110
5.3GrapheneSynthesisbyChemicalVaporDeposition112
5.3.1OverviewofCVDProcessofGrapheneSynthesis112
5.3.2ControlofGrapheneQuality113
5.4MetalDichalcogenideSynthesisbyChemicalVaporDeposition115
5.4.1OverviewofCVDProcessofMetalDichalcogenides115
5.4.2GrowthControlofMetalDichalcogenidesinChemicalVaporDeposition118
5.5Summary119
References120
